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Directed Self‐Assembly of Block Copolymers on Two‐Dimensional Chemical Patterns Fabricated by Electro‐Oxidation Nanolithography
Author(s) -
Xu Ji,
Park Soojin,
Wang Shiliu,
Russell Thomas P.,
Ocko Benjamin M.,
Checco Antonio
Publication year - 2010
Publication title -
advanced materials
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 10.707
H-Index - 527
eISSN - 1521-4095
pISSN - 0935-9648
DOI - 10.1002/adma.200903640
Subject(s) - copolymer , materials science , octadecyltrichlorosilane , monolayer , nanolithography , nanotechnology , polystyrene , patterned media , oxide , ethylene oxide , self assembly , fabrication , composite material , polymer , medicine , alternative medicine , pathology , metallurgy , grain size
A hexagonal web of carboxylic‐terminated nanostripes (left image, bright areas) is patterned onto a methyl‐terminated surface of an octadecyltrichlorosilane monolayer. A thermally annealed polystyrene‐ block ‐poly(ethylene oxide) (PS‐ b ‐PEO) thin‐film, spin‐cast on the chemical pattern (right image), exhibits surface normal oriented cylindrical PEO microdomains on the methyl‐terminated regions only. These chemical patterns effectively template the order and spatial orientation of diblock‐copolymer microdomains.