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Structural Characterization of Multi‐Quantum Wells in Electroabsorption‐Modulated Lasers by using Synchrotron Radiation Micrometer‐Beams
Author(s) -
Mino Lorenzo,
Gianolio Diego,
Agostini Giovanni,
Piovano Andrea,
Truccato Marco,
Agostino Angelo,
Cagliero Stefano,
MartinezCriado Gema,
Codato Simone,
Lamberti Carlo
Publication year - 2010
Publication title -
advanced materials
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 10.707
H-Index - 527
eISSN - 1521-4095
pISSN - 0935-9648
DOI - 10.1002/adma.200903407
Subject(s) - materials science , optoelectronics , synchrotron radiation , laser , quantum well , micrometer , characterization (materials science) , optics , radiation , absorption (acoustics) , synchrotron , nanotechnology , physics , composite material
Advanced optoelectronic devices require monolithic integration of different functions at chip level. This is the case of multi‐quantum well (MQW) electro absorption modulated lasers (EMLs) realized by using the selective area growth (SAG) technique, and which can be employed in long‐distance, high‐frequency optical fiber communication applications. We demonstrate that a micrometer‐resolved X‐ray beam available at third‐generation synchrotron radiation sources allows direct measurement of determinant structural parameters of MQW EML structures.