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Damascene Process for Controlled Positioning of Magnetic Colloidal Nanocrystals
Author(s) -
Chen Gang,
Bodnarchuk Maryna I.,
Kovalenko Maksym V.,
Springholz Gunther,
Heiss Wolfgang,
Jantsch Wolfgang,
Platzgummer Elmar,
Loeschner Hans,
Schotter Joerg
Publication year - 2010
Publication title -
advanced materials
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 10.707
H-Index - 527
eISSN - 1521-4095
pISSN - 0935-9648
DOI - 10.1002/adma.200902884
Subject(s) - materials science , copper interconnect , nanocrystal , wafer , scanning electron microscope , nanotechnology , polishing , chemical mechanical planarization , colloid , magnetic force microscope , composite material , chemical engineering , magnetic field , magnetization , physics , layer (electronics) , quantum mechanics , engineering
Nanocrystals, deposited on Si wafers , are maneuvered into sub‐100‐nm‐sized pits or grooves by a Damascene process, that is, dropcasting and subsequent mechanical polishing. Single occupation is demonstrated for magnetic nanocrystals with diameter down to 18 nm. The figure show scanning electron microscopy and magnetic force microscopy images for a set of pits occupied by single Fe 3 O 4 magnetic nanocrystals with 50‐nm size.