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Fabrication of Advanced Functional Devices Combining Soft Chemistry with X‐ray Lithography in One Step
Author(s) -
Falcaro Paolo,
Malfatti Luca,
Vaccari Lisa,
Amenitsch Heinz,
Marmiroli Benedetta,
Grenci Gianluca,
Innocenzi Plinio
Publication year - 2009
Publication title -
advanced materials
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 10.707
H-Index - 527
eISSN - 1521-4095
pISSN - 0935-9648
DOI - 10.1002/adma.200901561
Subject(s) - lithography , fabrication , nanotechnology , x ray lithography , materials science , soft lithography , photolithography , resist , next generation lithography , sol gel , computational lithography , computer science , electron beam lithography , optoelectronics , medicine , alternative medicine , pathology , layer (electronics)
Deep X‐ray lithography combined with sol–gel techniques offers facile fabrication of controlled patterned films. Using sol–gel, different functional properties can be induced; deep X‐ray lithography alters the functionality in the exposed regions. Miniaturized devices based on local property changes are easily fabricated: this technique requires no resist, enabling direct patterning of films in a one‐step lithographic process.
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