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Polymer Brushes with Nanometer‐Scale Gradients
Author(s) -
Schuh Christian,
Santer Svetlana,
Prucker Oswald,
Rühe Jürgen
Publication year - 2009
Publication title -
advanced materials
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 10.707
H-Index - 527
eISSN - 1521-4095
pISSN - 0935-9648
DOI - 10.1002/adma.200901515
Subject(s) - materials science , nanometre , monolayer , polymer , lithography , nanotechnology , polymer brush , scale (ratio) , nanoscopic scale , photoinitiator , brush , photolithography , composite material , polymerization , optoelectronics , physics , quantum mechanics , monomer
Surfaces with steep height or composition gradients at the nanometer scale are synthesized from self‐asssembled photoinitiator monolayers. The monolayers are prestructured by interference lithography followed by brush growth. Through step‐and‐repeat processes, surfaces with nano meter‐scale composition gradients are obtained.