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Control over Patterning of Organic Semiconductors: Step‐Edge‐Induced Area‐Selective Growth
Author(s) -
Wang Wenchong,
Du Chuan,
Zhong Dingyong,
Hirtz Michael,
Wang Yue,
Lu Nan,
Wu Lixin,
Ebeling Daniel,
Li Liqiang,
Fuchs Harald,
Chi Lifeng
Publication year - 2009
Publication title -
advanced materials
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 10.707
H-Index - 527
eISSN - 1521-4095
pISSN - 0935-9648
DOI - 10.1002/adma.200901091
Subject(s) - materials science , nucleation , organic semiconductor , enhanced data rates for gsm evolution , molecule , nanotechnology , semiconductor , mechanism (biology) , organic molecules , small molecule , schematic , optoelectronics , chemical physics , organic chemistry , computer science , electronic engineering , chemistry , telecommunications , philosophy , biochemistry , epistemology , engineering
A method concerning step‐edge‐induced area‐selective growth for the patterning of aromatic organic molecules is proposed. Based on such a growth mechanism, crack‐free, organic crystalline films and the growth of different molecules at defined locations can be achieved. The figure shows a schematic representation of the separation of molecules by nucleation‐sites recognition.