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One‐Step Direct‐Patterning Template Utilizing Self‐Assembly of POSS‐Containing Block Copolymers
Author(s) -
Hirai Tomoyasu,
Leolukman Melvina,
Liu Chi Chun,
Han Eungnak,
Kim Yun Jun,
Ishida Yoshihito,
Hayakawa Teruaki,
Kakimoto Masaaki,
Nealey Paul F.,
Gopalan Padma
Publication year - 2009
Publication title -
advanced materials
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 10.707
H-Index - 527
eISSN - 1521-4095
pISSN - 0935-9648
DOI - 10.1002/adma.200900518
Subject(s) - materials science , copolymer , annealing (glass) , self assembly , nanostructure , plasma etching , nanotechnology , template , chemical engineering , solvent , thin film , etching (microfabrication) , polymer chemistry , composite material , polymer , organic chemistry , layer (electronics) , chemistry , engineering
We report the self‐assembly of organic‐inorganic block copolymers (BCP) in thin‐films by simple solvent annealing on unmodified substrates. The resulting vertically oriented lamellae and cylinders are converted to a hard silica mask by a single step highly selective oxygen plasma etching. The size of the resulting nanostructures in the case of cylinders is less than 10 nm.