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Patterned Wettability Transition by Photoelectric Cooperative and Anisotropic Wetting for Liquid Reprography
Author(s) -
Tian Dongliang,
Chen Qinwen,
Nie FuQiang,
Xu Jinjie,
Song Yanlin,
Jiang Lei
Publication year - 2009
Publication title -
advanced materials
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 10.707
H-Index - 527
eISSN - 1521-4095
pISSN - 0935-9648
DOI - 10.1002/adma.200900022
Subject(s) - wetting , materials science , wetting transition , photoelectric effect , nanorod , anisotropy , optoelectronics , nanotechnology , photoconductivity , work (physics) , composite material , optics , mechanical engineering , physics , engineering
An approach to address the precise controllable patterned wettability transition on the superhydrophobic aligned photoconductive nanorod‐array surface via a photoelectric cooperative wetting process is described. This work is promising to gear up the application of locally confining liquids at a desired location, such as liquid reprography by patterned‐light illumination.