Patterned Wettability Transition by Photoelectric Cooperative and Anisotropic Wetting for Liquid Reprography | Zendy

Tian Dongliang | Zendy; Chen Qinwen | Zendy; Nie FuQiang | Zendy; Xu Jinjie | Zendy; Song Yanlin | Zendy; Jiang Lei | Zendy

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Patterned Wettability Transition by Photoelectric Cooperative and Anisotropic Wetting for Liquid Reprography

Author(s) -

Tian Dongliang,

Chen Qinwen,

Nie FuQiang,

Xu Jinjie,

Song Yanlin,

Jiang Lei

Publication year - 2009

Publication title -

advanced materials

Language(s) - English

Resource type - Journals

SCImago Journal Rank - 10.707

H-Index - 527

eISSN - 1521-4095

pISSN - 0935-9648

DOI - 10.1002/adma.200900022

Subject(s) - wetting , materials science , wetting transition , photoelectric effect , nanorod , anisotropy , optoelectronics , nanotechnology , photoconductivity , work (physics) , composite material , optics , mechanical engineering , physics , engineering

An approach to address the precise controllable patterned wettability transition on the superhydrophobic aligned photoconductive nanorod‐array surface via a photoelectric cooperative wetting process is described. This work is promising to gear up the application of locally confining liquids at a desired location, such as liquid reprography by patterned‐light illumination.

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