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Cover Picture: Spatially Localized Photoluminescence at 1.5 Micrometers Wavelength in Direct Laser Written Optical Nanostructures (Adv. Mater. 21/2008)
Author(s) -
Wong Sean,
Kiowski Oliver,
Kappes Manfred,
Lindner Jörg K. N.,
Mandal Nirajan,
Peiris Frank C.,
Ozin Geoffrey A.,
Thiel Michael,
Braun Markus,
Wegener Martin,
von Freymann Georg
Publication year - 2008
Publication title -
advanced materials
Language(s) - English
Resource type - Reports
SCImago Journal Rank - 10.707
H-Index - 527
eISSN - 1521-4095
pISSN - 0935-9648
DOI - 10.1002/adma.200890085
Subject(s) - photoluminescence , materials science , optoelectronics , laser , nanolithography , photonics , wavelength , photoresist , cover (algebra) , nanostructure , refractive index , optics , nanotechnology , optical materials , fabrication , layer (electronics) , medicine , mechanical engineering , physics , alternative medicine , engineering , pathology
A grand challenge in 3D nanolithography is to place near‐IR photoluminescent guests precisely where desired in a high‐refractive‐index nanostructured host. This objective has now been reduced to practice, as reported by Georg von Freymann, Sean Wong, and coworkers on p. 4097 , by using direct laser writing in an As 2 S 3 all‐inorganic photoresist doped with Er 3+ ions. Such precise placement is considered a key step towards miniaturized optical, electro‐optical, and photonic devices. Cover artwork by M.S. Rill.