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Cover Picture: Polyelectrolyte Negative Resist Patterns as Templates for the Electrostatic Assembly of Nanoparticles and Electroless Deposition of Metallic Films (Adv. Mater. 13/2008)
Author(s) -
Ofir Yuval,
Samanta Bappaditya,
Xiao Qijun,
Jordan Brian J.,
Xu Hao,
Arumugam Palaniappan,
Arvizo Rochelle,
Tuominen Mark T.,
Rotello Vincent M.
Publication year - 2008
Publication title -
advanced materials
Language(s) - English
Resource type - Reports
SCImago Journal Rank - 10.707
H-Index - 527
eISSN - 1521-4095
pISSN - 0935-9648
DOI - 10.1002/adma.200890051
Subject(s) - materials science , nanotechnology , resist , template , lithography , nanoparticle , polymer , self assembly , electron beam lithography , cationic polymerization , polyelectrolyte , nanostructure , polymer chemistry , optoelectronics , composite material , layer (electronics)
Cationic and anionic polymers provide negative resists for electron beam lithography. These patterned polymer features can then be employed as templates for electrostatic self‐assembly of magnetic, metallic, or semiconducting nanoparticles, or for electroless deposition of metals. This synergistic integration of bottom‐up and top‐down methodologies, reported by Vincent Rotello and co‐workers on p. 2561 combines the versatility and modularity of self‐assembly processes and the proven capabilities of lithographic techniques.