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Wafer‐Level Patterned and Aligned Polymer Nanowire/Micro‐ and Nanotube Arrays on any Substrate
Author(s) -
Morber Jenny Ruth,
Wang Xudong,
Liu Jin,
Snyder Robert L.,
Wang Zhong Lin
Publication year - 2009
Publication title -
advanced materials
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 10.707
H-Index - 527
eISSN - 1521-4095
pISSN - 0935-9648
DOI - 10.1002/adma.200803648
Subject(s) - materials science , wafer , nanotechnology , substrate (aquarium) , nanowire , stamping , fabrication , etching (microfabrication) , polymer , nanotube , polymer substrate , plasma etching , carbon nanotube , composite material , layer (electronics) , medicine , oceanography , alternative medicine , pathology , metallurgy , geology
A novel technique for fabrication of patterned and aligned polymer‐nanowire/micro‐and nanotube (PNW/PNT) arrays on a wafer‐level substrate of any material is reported. By creating a designed pattern on a spin‐coated polymer film using techniques, such as stamping or micro‐tip writing, plasma etching results in the formation of aligned PNW arrays distributed according to the pattern.