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Fabrication of Freestanding Nanoporous Polyethersulfone Membranes Using Organometallic Polymer Resists Patterned by Nanosphere Lithography
Author(s) -
Acikgoz Canet,
Ling Xing Yi,
Phang In Yee,
Hempenius Mark A.,
Reinhoudt David N.,
Huskens Jurriaan,
Vancso G. Julius
Publication year - 2009
Publication title -
advanced materials
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 10.707
H-Index - 527
eISSN - 1521-4095
pISSN - 0935-9648
DOI - 10.1002/adma.200803647
Subject(s) - materials science , resist , nanoporous , polysulfone , lithography , membrane , nanotechnology , wafer , fabrication , polymer , soft lithography , optoelectronics , composite material , layer (electronics) , chemistry , medicine , alternative medicine , pathology , biochemistry
Freestanding nanoporous polysulfone membranes are fabricated using nanosphere lithography, in which colloidal silica particles act as a template for the organometallic etch resist, which is composed of poly(ferrocenylsilanes). As shown in the figure, the membranes are robust enough to be removed from the silica wafers where they were produced. They can subsequently be used to separate particles of different sizes.