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Block Copolymer Nanolithography: Translation of Molecular Level Control to Nanoscale Patterns
Author(s) -
Bang Joona,
Jeong Unyong,
Ryu Du Yeol,
Russell Thomas P.,
Hawker Craig J.
Publication year - 2009
Publication title -
advanced materials
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 10.707
H-Index - 527
eISSN - 1521-4095
pISSN - 0935-9648
DOI - 10.1002/adma.200803302
Subject(s) - copolymer , materials science , nanolithography , nanotechnology , nanoscopic scale , fabrication , block (permutation group theory) , nanostructure , translation (biology) , polymer , composite material , medicine , biochemistry , chemistry , alternative medicine , geometry , mathematics , pathology , messenger rna , gene
The self‐asembly of block copolymers is a promising platform for the “bottom‐up” fabrication of nanostructured materials and devices. This review covers some of the advances made in this field from the laboratory setting to applications where block copolymers are in use.