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Solvent‐Vapor‐Induced Tunability of Self‐Assembled Block Copolymer Patterns
Author(s) -
Jung Yeon Sik,
Ross Caroline A.
Publication year - 2009
Publication title -
advanced materials
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 10.707
H-Index - 527
eISSN - 1521-4095
pISSN - 0935-9648
DOI - 10.1002/adma.200802855
Subject(s) - copolymer , materials science , solvent , lamellar structure , annealing (glass) , vapor pressure , chemical engineering , nanotechnology , organic chemistry , composite material , polymer , chemistry , engineering
Self‐assembly of a block copolymer into cylindrical and/or perforated lamellar arrays within substrate trenches can be extensively tuned during the solvent‐annealing process. Following reactive‐ion etching, SEM images reveal that the solvent mixing ratio and the vapor pressure determine the type of array obtained and influence the dimensions of the repeat unit.