Direct Laser Writing of Nanosized Oligofluorene Truxenes in UV‐Transparent Photoresist Microstructures | Zendy

Kuehne Alexander J. C. | Zendy; Elfström David | Zendy; Mackintosh Allan R. | Zendy; Kanibolotsky Alexander L. | Zendy; Guilhabert Benoit | Zendy; Gu Erdan | Zendy; Perepichka Igor F. | Zendy; Skabara Peter J. | Zendy; Dawson Martin D. | Zendy; Pethrick Richard A. | Zendy

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Direct Laser Writing of Nanosized Oligofluorene Truxenes in UV‐Transparent Photoresist Microstructures

Author(s) -

Kuehne Alexander J. C.,

Elfström David,

Mackintosh Allan R.,

Kanibolotsky Alexander L.,

Guilhabert Benoit,

Gu Erdan,

Perepichka Igor F.,

Skabara Peter J.,

Dawson Martin D.,

Pethrick Richard A.

Publication year - 2009

Publication title -

advanced materials

Language(s) - English

Resource type - Journals

SCImago Journal Rank - 10.707

H-Index - 527

eISSN - 1521-4095

pISSN - 0935-9648

DOI - 10.1002/adma.200802656

Subject(s) - photoresist , materials science , microstructure , nanotechnology , nanostructure , laser , optics , composite material , physics , layer (electronics)

Recently developed star‐shaped nanosized oligofluorene truxenes are dispersed in a novel vinyl ether based photoresist to produce microstructures via direct laser writing. The technique offers rapid and facile production of nanostructures whithin a microstructure, and ensures environmental protection from photo‐oxidation of the fluorescent molecules.

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