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Direct Laser Writing of Nanosized Oligofluorene Truxenes in UV‐Transparent Photoresist Microstructures
Author(s) -
Kuehne Alexander J. C.,
Elfström David,
Mackintosh Allan R.,
Kanibolotsky Alexander L.,
Guilhabert Benoit,
Gu Erdan,
Perepichka Igor F.,
Skabara Peter J.,
Dawson Martin D.,
Pethrick Richard A.
Publication year - 2009
Publication title -
advanced materials
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 10.707
H-Index - 527
eISSN - 1521-4095
pISSN - 0935-9648
DOI - 10.1002/adma.200802656
Subject(s) - photoresist , materials science , microstructure , nanotechnology , nanostructure , laser , optics , composite material , physics , layer (electronics)
Recently developed star‐shaped nanosized oligofluorene truxenes are dispersed in a novel vinyl ether based photoresist to produce microstructures via direct laser writing. The technique offers rapid and facile production of nanostructures whithin a microstructure, and ensures environmental protection from photo‐oxidation of the fluorescent molecules.