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Hierarchically Ordered Topographic Patterns via Plasmonic Mask Photolithography
Author(s) -
Kim Woo Soo,
Jia Lin,
Thomas Edwin L.
Publication year - 2009
Publication title -
advanced materials
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 10.707
H-Index - 527
eISSN - 1521-4095
pISSN - 0935-9648
DOI - 10.1002/adma.200802434
Subject(s) - photoresist , photolithography , plasmon , materials science , lithography , surface plasmon resonance , nanotechnology , optoelectronics , plasmonic nanoparticles , nanoparticle , layer (electronics)
By employing a block copolymer to spatially organize silver nanoparticles , laser light can be concentrated via plasmon resonance to locally expose a photoresist. By subsequent development, this plasmonic lithography can provide deep subwavelength scale features.