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Nanoscale Writing of Transparent Conducting Oxide Features with a Focused Ion Beam
Author(s) -
Sosa Norma E.,
Liu Jun,
Chen Christopher,
Marks Tobin J.,
Hersam Mark C.
Publication year - 2009
Publication title -
advanced materials
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 10.707
H-Index - 527
eISSN - 1521-4095
pISSN - 0935-9648
DOI - 10.1002/adma.200802129
Subject(s) - materials science , nanoscopic scale , oxide , focused ion beam , resistive touchscreen , ion beam , optoelectronics , nanotechnology , nanowire , thin film , transparent conducting film , beam (structure) , ion , optics , electrical engineering , physics , quantum mechanics , metallurgy , engineering
Embedded, optically transparent, electrically conducting oxide nanowires , and other patterns are written on highly resistive transparent metal oxide thin films with nanoscale spatial control using focused ion beam implantation. The resulting transparent conducting oxide features are 110‐160 nm wide, 7 nm deep, and are theoretically limitless in length, connectivity, and shape.