Hyperbranched Polymers for Photolithographic Applications – Towards Understanding the Relationship between Chemical Structure of Polymer Resin and Lithographic Performances | Zendy

Chochos Christos L. | Zendy; Ismailova Esma | Zendy; Brochon Cyril | Zendy; Leclerc Nicolas | Zendy; Tiron Raluca | Zendy; Sourd Claire | Zendy; Bandelier Philippe | Zendy; Foucher Johann | Zendy; Ridaoui Hassan | Zendy; Dirani Ali | Zendy; Soppera Olivier | Zendy; Perret Damien | Zendy; Brault Christophe | Zendy; Serra Christophe A. | Zendy; Hadziioannou Georges | Zendy

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Hyperbranched Polymers for Photolithographic Applications – Towards Understanding the Relationship between Chemical Structure of Polymer Resin and Lithographic Performances

Author(s) -

Chochos Christos L.,

Ismailova Esma,

Brochon Cyril,

Leclerc Nicolas,

Tiron Raluca,

Sourd Claire,

Bandelier Philippe,

Foucher Johann,

Ridaoui Hassan,

Dirani Ali,

Soppera Olivier,

Perret Damien,

Brault Christophe,

Serra Christophe A.,

Hadziioannou Georges

Publication year - 2009

Publication title -

advanced materials

Language(s) - English

Resource type - Journals

SCImago Journal Rank - 10.707

H-Index - 527

eISSN - 1521-4095

pISSN - 0935-9648

DOI - 10.1002/adma.200801715

Subject(s) - resist , polymer , lithography , atom transfer radical polymerization , materials science , polymer chemistry , polymerization , photolithography , side chain , chemical engineering , nanotechnology , composite material , optoelectronics , layer (electronics) , engineering

A chemically amplified resist based on a hyperbranched polymer resin is demonstrated for the first time. The hyperbranched polymer is synthesized using the atom‐transfer radical polymerization (ATRP) technique, and resists prepared from this hyperbranched polymer present good pattern profiles and line‐edge roughness (3σ) values comparable to those of the reference (commercial) resist.

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