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The Origin of the Magnetism of Etched Silicon
Author(s) -
Grace Patrick J.,
Venkatesan Munuswamy,
Alaria Jonathan,
Coey J. Michael D.,
Kopnov Gregory,
Naaman Ron
Publication year - 2009
Publication title -
advanced materials
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 10.707
H-Index - 527
eISSN - 1521-4095
pISSN - 0935-9648
DOI - 10.1002/adma.200801098
Subject(s) - materials science , pourbaix diagram , silicon , ferromagnetism , magnetism , etching (microfabrication) , nanoparticle , isotropic etching , nanotechnology , metallurgy , condensed matter physics , chemistry , layer (electronics) , physics , electrode , electrochemistry
A recent report of ferromagnetism appearing in silicon after etching in hot KOH (Kopnov et al., Adv. Mater. 2007 , 19 , 925) is shown to be due to iron from the pyrex glassware, which precipitates on the silicon surface in the form of well‐separated ferromagnetic nanoparticles. The reaction is explained in terms of the Pourbaix diagram.