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Single‐Photon and Two‐Photon Induced Photocleavage for Monolayers of an Alkyltriethoxysilane with a Photoprotected Carboxylic Ester
Author(s) -
Álvarez Marta,
Best Andreas,
PradhanKadam Swapna,
Koynov Kaloian,
Jonas Ulrich,
Kreiter Maximilian
Publication year - 2008
Publication title -
advanced materials
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 10.707
H-Index - 527
eISSN - 1521-4095
pISSN - 0935-9648
DOI - 10.1002/adma.200800746
Subject(s) - monolayer , femtosecond , materials science , photochemistry , photon , photolithography , diffraction , two photon excitation microscopy , laser , optoelectronics , nanotechnology , optics , chemistry , fluorescence , physics
The photochemical structuring of a polysiloxane monolayer protected with a photocleavable group is shown by femtosecond laser pulses in the near infrared. These experiments suggest a two‐photon induced deprotection process that holds great promise for near‐field monolayer photolithography far below the diffraction limit.