Single‐Photon and Two‐Photon Induced Photocleavage for Monolayers of an Alkyltriethoxysilane with a Photoprotected Carboxylic Ester | Zendy

Álvarez Marta | Zendy; Best Andreas | Zendy; PradhanKadam Swapna | Zendy; Koynov Kaloian | Zendy; Jonas Ulrich | Zendy; Kreiter Maximilian | Zendy

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Single‐Photon and Two‐Photon Induced Photocleavage for Monolayers of an Alkyltriethoxysilane with a Photoprotected Carboxylic Ester

Author(s) -

Álvarez Marta,

Best Andreas,

PradhanKadam Swapna,

Koynov Kaloian,

Jonas Ulrich,

Kreiter Maximilian

Publication year - 2008

Publication title -

advanced materials

Language(s) - English

Resource type - Journals

SCImago Journal Rank - 10.707

H-Index - 527

eISSN - 1521-4095

pISSN - 0935-9648

DOI - 10.1002/adma.200800746

Subject(s) - monolayer , femtosecond , materials science , photochemistry , photon , photolithography , diffraction , two photon excitation microscopy , laser , optoelectronics , nanotechnology , optics , chemistry , fluorescence , physics

The photochemical structuring of a polysiloxane monolayer protected with a photocleavable group is shown by femtosecond laser pulses in the near infrared. These experiments suggest a two‐photon induced deprotection process that holds great promise for near‐field monolayer photolithography far below the diffraction limit.

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