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Formation and Surface Modification of Nanopatterned Thiol‐ene Substrates using Step and Flash Imprint Lithography
Author(s) -
Khire Vaibhav S.,
Yi Youngwoo,
Clark Noel A.,
Bowman Christopher N.
Publication year - 2008
Publication title -
advanced materials
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 10.707
H-Index - 527
eISSN - 1521-4095
pISSN - 0935-9648
DOI - 10.1002/adma.200800672
Subject(s) - lithography , materials science , polymer , nanotechnology , thiol , flash (photography) , layer (electronics) , ene reaction , substrate (aquarium) , surface modification , polymer chemistry , chemical engineering , organic chemistry , chemistry , composite material , optoelectronics , art , visual arts , oceanography , geology , engineering
Functionalized, thiol‐ene nanopatterned materials are fabricated using step and flash imprint lithography (SFIL) and are readily modified with a micropatterned, secondary polymer layer through the unreacted pendant thiols on the surface. Thiol‐enes offer versatile chemistry, rapid curing and excellent control over polymer properties using stoichiometry and functionality for both base substrate and attached secondary polymer layer.