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Photoresist‐Free Lithographic Patterning of Solution‐Processed Nanostructured Metal Thin Films
Author(s) -
Shin Hyunkwon,
Kim Hyunjun,
Lee Hyeongjae,
Yoo Hyeonggeun,
Kim Jinsoo,
Kim Hyoungsub,
Lee Myeongkyu
Publication year - 2008
Publication title -
advanced materials
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 10.707
H-Index - 527
eISSN - 1521-4095
pISSN - 0935-9648
DOI - 10.1002/adma.200800157
Subject(s) - photoresist , materials science , lithography , thin film , layer (electronics) , nanotechnology , optoelectronics , photolithography , laser , nanosphere lithography , fabrication , optics , medicine , physics , alternative medicine , pathology
Nanostructured Ag thin films solution‐deposited on glass and plastic substrates are patterned by direct exposure to a pulsed Nd:YAG laser without using a photoresist layer. Sharp‐edged patterns with a feature size scaled down to ca. 2 µm are obtainable.
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