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Inside Front Cover: Direct Patterning, Conformal Coating, and Erbium Doping of Luminescent nc‐Si/SiO 2 Thin Films from Solution Processable Hydrogen Silsesquioxane (Adv. Mater. 21/2007)
Author(s) -
Hessel C. M.,
Summers M. A.,
Meldrum A.,
Malac M.,
Veinot J. G. C.
Publication year - 2007
Publication title -
advanced materials
Language(s) - English
Resource type - Reports
SCImago Journal Rank - 10.707
H-Index - 527
eISSN - 1521-4095
pISSN - 0935-9648
DOI - 10.1002/adma.200790084
Subject(s) - materials science , hydrogen silsesquioxane , conformal coating , luminescence , thin film , silsesquioxane , nanostructure , doping , nanotechnology , resist , silicon , optoelectronics , coating , layer (electronics) , composite material , polymer , electron beam lithography
Abstract Patterned nanostructure arrays of luminescent, oxide‐embedded silicon nanocrystals (nc‐Si) are formed by reductively thermally processing e‐beam patterns of hydrogen silsesquioxane (HSQ). While traditionally employed as a negative type e‐beam resist, HSQ is shown to produce thin films, non‐flat conformal coatings, and sub‐10 nm structures that contain luminescent nc‐Si. The variety of morphologies (structures) that can be produced by this method highlights the versatility of HSQ as a nc‐Si precursor, report Jonathan Veinot and co‐workers from the University of Alberta, Canada on p. 3513.