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Inside Front Cover: Plasma‐Assisted Synthesis of Silicon Nanocrystal Inks (Adv. Mater. 18/2007)
Author(s) -
Mangolini L.,
Kortshagen U.
Publication year - 2007
Publication title -
advanced materials
Language(s) - English
Resource type - Reports
SCImago Journal Rank - 10.707
H-Index - 527
eISSN - 1521-4095
pISSN - 0935-9648
DOI - 10.1002/adma.200790071
Subject(s) - nanocrystal , materials science , nucleation , silicon , colloid , silane , nanotechnology , plasma , chemical engineering , dissociation (chemistry) , molecule , optoelectronics , organic chemistry , composite material , chemistry , physics , quantum mechanics , engineering
The inside cover shows a photo and a schematic of a two‐step nonthermal plasma process used to produced silicon nanocrystal inks, that is, stable colloidal solutions of silicon nanocrystals. In the first (upper) plasma, nanocrystals are formed through plasma‐induced dissociation of silane molecules, leading to nanocrystal nucleation through chemical clustering. In the second (lower) plasma step, organic ligands are attached in‐flight to the silicon nanocrystal surfaces. The collected powder of surface functionalized silicon nanocrystals readily forms stable colloidal solutions in nonpolar solvents, report Lorenzo Mangolini and Uwe Kortshagen on p. 2513.