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Self‐Assembled Si Quantum‐Ring Structures on a Si Substrate by Plasma‐Enhanced Chemical Vapor Deposition Based on a Growth‐Etching Competition Mechanism
Author(s) -
Yu L. W.,
Chen K. J.,
Song J.,
Xu J.,
Li W.,
Li H. M.,
Wang M.,
Li X. F.,
Huang X. F.
Publication year - 2007
Publication title -
advanced materials
Language(s) - Czech
Resource type - Journals
SCImago Journal Rank - 10.707
H-Index - 527
eISSN - 1521-4095
pISSN - 0935-9648
DOI - 10.1002/adma.200790067
Subject(s) - microstructure , competition (biology) , chemical vapor deposition , china , materials science , ring (chemistry) , etching (microfabrication) , nanotechnology , substrate (aquarium) , chinese academy of sciences , physics , engineering physics , chemistry , metallurgy , organic chemistry , layer (electronics) , geology , archaeology , geography , ecology , oceanography , biology