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Cover Picture: Large‐Area 3D Nanostructures with Octagonal Quasicrystalline Symmetry via Phase‐Mask Lithography (Adv. Mater. 10/2007)
Author(s) -
Bita I.,
Choi T.,
Walsh M. E.,
Smith H. I.,
Thomas E. L.
Publication year - 2007
Publication title -
advanced materials
Language(s) - English
Resource type - Reports
SCImago Journal Rank - 10.707
H-Index - 527
eISSN - 1521-4095
pISSN - 0935-9648
DOI - 10.1002/adma.200790037
Subject(s) - materials science , polydimethylsiloxane , quasiperiodic function , lithography , quasicrystal , nanostructure , replica , nanotechnology , phase (matter) , nanosphere lithography , symmetry (geometry) , optoelectronics , condensed matter physics , geometry , physics , medicine , art , visual arts , alternative medicine , pathology , quantum mechanics , fabrication , mathematics
A novel method for producing large‐area 3D nanostructured quasicrystalline materials uses 2D multiple exposure lithography to produce an octagonal quasiperiodic surface‐relief template (background image). A replica in polydimethylsiloxane is then used as a phase mask to create 3D bicontinuous axial quasicrystalline SU‐8 epoxy nanostructures (see insets), as reported on p. 1403 by Ion Bita, Edwin Thomas, and co‐workers.