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Polyelectrolyte Negative Resist Patterns as Templates for the Electrostatic Assembly of Nanoparticles and Electroless Deposition of Metallic Films
Author(s) -
Ofir Yuval,
Samanta Bappaditya,
Xiao Qijun,
Jordan Brian J.,
Xu Hao,
Arumugam Palaniappan,
Arvizo Rochelle,
Tuominen Mark T.,
Rotello Vincent M.
Publication year - 2008
Publication title -
advanced materials
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 10.707
H-Index - 527
eISSN - 1521-4095
pISSN - 0935-9648
DOI - 10.1002/adma.200703095
Subject(s) - materials science , resist , template , cationic polymerization , lithography , nanotechnology , polymer , nanoparticle , electron beam lithography , deposition (geology) , metal , polystyrene , nanostructure , pyridine , chemical engineering , polymer chemistry , organic chemistry , optoelectronics , layer (electronics) , chemistry , composite material , paleontology , sediment , engineering , metallurgy , biology
Electron‐beam lithography is used to pattern either cationic polyvinyl N ‐methyl pyridine or anionic sulfonated polystyrene polymers, that act as negative resists, to produce templates for electroless deposition and the electrostatic assembly of metallic, magnetic, or semiconductor nanoparticles.