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Motif Transfer: Down to 3 nm in Resolution Using Individual Nanocrystals
Author(s) -
Ingert Dorothée,
Pileni Marie Paule
Publication year - 2008
Publication title -
advanced materials
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 10.707
H-Index - 527
eISSN - 1521-4095
pISSN - 0935-9648
DOI - 10.1002/adma.200703000
Subject(s) - materials science , nanocrystal , nanotechnology , graphite , etching (microfabrication) , silicon , colloid , substrate (aquarium) , optoelectronics , chemical engineering , composite material , oceanography , layer (electronics) , geology , engineering
Graphite and silicon nanoneedles are fabricated by different etching processes on HOPG and SiO χ . The masks used to engrave such substrates are needle‐shaped ferrite nanocrystals. We demonstrate that nanocrystals achieve the role of colloidal masks leading to resolutions down to 10 nm in distance between objects when the etched substrate is SiO χ and less than 3 nm when it is HOPG.