Premium
Universal Block Copolymer Lithography for Metals, Semiconductors, Ceramics, and Polymers
Author(s) -
Jeong SeongJun,
Xia Guodong,
Kim Bong Hoon,
Shin Dong Ok,
Kwon SeHun,
Kang SangWon,
Kim Sang Ouk
Publication year - 2008
Publication title -
advanced materials
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 10.707
H-Index - 527
eISSN - 1521-4095
pISSN - 0935-9648
DOI - 10.1002/adma.200702930
Subject(s) - materials science , copolymer , lithography , polymer , ceramic , nanotechnology , semiconductor , polymer science , optoelectronics , metallurgy , composite material
A universal block copolymer lithography is developed for a broad spectrum of materials including metals, semiconductors, ceramics, and polymers by combining advanced film deposition techniques with block copolymer lithography. The figure presents a nanopatterned platinum film prepared by applying universal block copolymer lithography.