Premium
Fabrication of Mesoporous Functionalized Arrays by Integrating Deep X‐Ray Lithography with Dip‐Pen Writing
Author(s) -
Falcaro Paolo,
Costacurta Stefano,
Malfatti Luca,
Takahashi Masahide,
Kidchob Tongjit,
Casula Maria Francesca,
Piccinini Massimo,
Marcelli Augusto,
Marmiroli Benedetta,
Amenitsch Heinz,
Schiavuta Piero,
Innocenzi Plinio
Publication year - 2008
Publication title -
advanced materials
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 10.707
H-Index - 527
eISSN - 1521-4095
pISSN - 0935-9648
DOI - 10.1002/adma.200702795
Subject(s) - materials science , lithography , mesoporous material , fabrication , nanotechnology , resist , x ray lithography , surface modification , mesoporous silica , synchrotron radiation , optoelectronics , chemical engineering , optics , catalysis , organic chemistry , layer (electronics) , chemistry , medicine , alternative medicine , physics , pathology , engineering
Deep X‐ray lithography (DXRL) allows the highly controlled patterning of mesoporous films (see figure). This technique requires no resist, enabling direct patterning without causing mesostructure degradation. Increase of silica polycondensation and partial removal of the templating agent is induced by synchrotron radiation. Selective functionalization of the mesoporous objects is achieved by combining DXRL with dip‐pen writing.