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Calix[4]resorcinarene Derivatives as High‐Resolution Resist Materials for Supercritical CO 2 Processing
Author(s) -
Felix Nelson M.,
De Silva Anuja,
Ober Christopher K.
Publication year - 2008
Publication title -
advanced materials
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 10.707
H-Index - 527
eISSN - 1521-4095
pISSN - 0935-9648
DOI - 10.1002/adma.200702772
Subject(s) - resorcinarene , resist , materials science , supercritical fluid , lithography , solubility , high resolution , nanotechnology , chemical engineering , organic chemistry , molecule , optoelectronics , chemistry , remote sensing , layer (electronics) , geology , engineering
Ultra‐high‐resolution lithography resists based on calix[4] resorcinarene derivatives are shown to be compatible with supercritica l CO 2 processing upon the incorporation of specific functionali ties, as illustrated by the inset to the figure. The compounds show high glass‐transition temperatures, excellent solubility in supercritical CO 2 , and good film forming properties, enabling the patterning of line/space features as small as 70 nm (depicted in the figure).
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