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Focused‐Ion‐Beam‐Based Selective Closing and Opening of Anodic Alumina Nanochannels for the Growth of Nanowire Arrays Comprising Multiple Elements
Author(s) -
Liu NaiWei,
Liu ChihYi,
Wang HuaiHsien,
Hsu ChenFeng,
Lai MingYu,
Chuang TungHan,
Wang YuhLin
Publication year - 2008
Publication title -
advanced materials
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 10.707
H-Index - 527
eISSN - 1521-4095
pISSN - 0935-9648
DOI - 10.1002/adma.200702604
Subject(s) - materials science , nanowire , anode , resist , nanotechnology , ion beam , ion , focused ion beam , sputtering , porosity , thin film , composite material , electrode , chemistry , physics , layer (electronics) , quantum mechanics
A lithographic process based on focused ion beam bombardment is developed for selectively closing and opening nanochannels on a porous anodic alumina film. This resist‐free process is based on the use of focused ion beams with different energies that strike a balance between material sputtering and material relocation. This process is used to selectively grow nanowire patterns of different elements.