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Two‐Dimensional Patterning of Flexible Designs with High Half‐Pitch Resolution by Using Block Copolymer Lithography
Author(s) -
Yamaguchi Toru,
Yamaguchi Hiroshi
Publication year - 2008
Publication title -
advanced materials
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 10.707
H-Index - 527
eISSN - 1521-4095
pISSN - 0935-9648
DOI - 10.1002/adma.200702546
Subject(s) - materials science , nanodevice , lithography , copolymer , electron beam lithography , fabrication , bent molecular geometry , substrate (aquarium) , nanotechnology , next generation lithography , multiple patterning , resolution (logic) , x ray lithography , photolithography , resist , optoelectronics , optics , polymer , composite material , computer science , medicine , oceanography , alternative medicine , physics , layer (electronics) , pathology , geology , artificial intelligence
A two‐dimensional patterning method that allows for flexible designs is demonstrated by combining bottom‐up diblock copolymer self‐assembly with top‐down electron beam lithography (EBL), which increases the applicability of block copolymer lithography to nanodevice fabrication. Both bent lamellae and concentric cylinders (see figure) can be formed between the intentionally designed 2D EBL guiding patterns, and can be successfully transferred to a semiconductor substrate with a 16 nm half‐pitch resolution.