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The Patterning of Sub‐500 nm Inorganic Oxide Structures
Author(s) -
Hampton Meredith J.,
Williams Stuart S.,
Zhou Zhilian,
Nunes Janine,
Ko DooHyun,
Templeton Joseph L.,
Samulski Edward T.,
DeSimone Joseph M.
Publication year - 2008
Publication title -
advanced materials
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 10.707
H-Index - 527
eISSN - 1521-4095
pISSN - 0935-9648
DOI - 10.1002/adma.200702495
Subject(s) - materials science , oxide , nanotechnology , complex oxide , chemical engineering , metallurgy , engineering
Elastomeric perfluoropolyether molds are applied to pattern arrays of sub‐500 nm inorganic oxide features. This versatile soft‐lithography technique can be used to pattern a wide range of materials; in this work inorganic oxides including TiO 2 , SnO 2 , ZnO, ITO, and BaTiO 3 are patterned on a variety of substrates with different aspect ratios. An example of TiO 2 posts is shown in the figure.
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