Nanoimprint Lithography on Silica Sol–Gels: A Simple Route to Sequential Patterning

Inorganic condensing sol‐gel films are promising resist materials for nanoimprint lithography. We demonstrate that sequential patterning of these materials can be performed by controlling their condensation state. As a consequence, multilevel inorganic patterns can be obtained by superimposing structures, as show here, where successive stamping of a line pattern leads to two‐level square features.