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Hierarchical Self‐Assembly of Block Copolymers for Lithography‐Free Nanopatterning
Author(s) -
Kim Bong Hoon,
Shin Dong Ok,
Jeong SeongJun,
Koo Chong Min,
Jeon Sang Chul,
Hwang Wook Jung,
Lee Sumi,
Lee Moon Gyu,
Kim Sang Ouk
Publication year - 2008
Publication title -
advanced materials
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 10.707
H-Index - 527
eISSN - 1521-4095
pISSN - 0935-9648
DOI - 10.1002/adma.200702285
Subject(s) - materials science , dewetting , micropatterning , copolymer , lithography , self assembly , nanotechnology , polymer , annealing (glass) , thin film , optoelectronics , composite material
Hierarchical self‐assembly of block copolymers has been achieved by two steps of sequential ordering processes, consisting of self‐organized micropatterning from a dewetting block polymer solution and thermal annealing. The self‐organized micropattern induces the spontaneous alignment of self‐assembled lamellae (see figure), which is successfully applied for a lithography‐free, ultra‐large‐scale nanopatterning.
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