Highly Ordered Arrays of Mesoporous Silica Nanorods with Tunable Aspect Ratios from Block Copolymer Thin Films | Zendy

Chen A. | Zendy; Komura M. | Zendy; Kamata K. | Zendy; Iyoda T. | Zendy

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Highly Ordered Arrays of Mesoporous Silica Nanorods with Tunable Aspect Ratios from Block Copolymer Thin Films

Author(s) -

Chen A.,

Komura M.,

Kamata K.,

Iyoda T.

Publication year - 2008

Publication title -

advanced materials

Language(s) - English

Resource type - Journals

SCImago Journal Rank - 10.707

H-Index - 527

eISSN - 1521-4095

pISSN - 0935-9648

DOI - 10.1002/adma.200702010

Subject(s) - nanorod , copolymer , materials science , template , mesoporous silica , mesoporous material , thin film , nanotechnology , chemical engineering , composite material , organic chemistry , polymer , chemistry , catalysis , engineering

Highly ordered arrays of mesoporous silica nanorods with a tunable aspect ratio can be fabricated using PEO m ‐ b ‐PMA(Az) n block copolymer thin films as templates. Together, penetration of the films by the silica precursor and the film thickness control the SiO 2 nanorod growth, and heights of almost 200 nm can be achieved. Inside the SiO 2 nanorods, mesochannels with a diameter of ∼ 2 nm are formed that are aligned along the longitudinal axis of the rod.

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