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Nanopatterned Self‐Assembled Monolayers by Using Diblock Copolymer Micelles as Nanometer‐Scale Adsorption and Etch Masks
Author(s) -
Krishnamoorthy Sivashankar,
Pugin Raphael,
Brugger Juergen,
Heinzelmann Harry,
Hinderling Christian
Publication year - 2008
Publication title -
advanced materials
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 10.707
H-Index - 527
eISSN - 1521-4095
pISSN - 0935-9648
DOI - 10.1002/adma.200702005
Subject(s) - copolymer , monolayer , materials science , nanometre , micelle , self assembled monolayer , self assembly , nanotechnology , nanoscopic scale , adsorption , nanostructure , chemical engineering , polymer , composite material , organic chemistry , aqueous solution , chemistry , engineering
Nanopatterned self‐assembled monolayers (SAMs) are obtained from a simple, straight‐forward procedure by using masks derived from monolayers of block copolymer micelles. The nanopatterned SAMs consist of regularly spaced circular hydrophilic areas with diameters of approximately 60 nm on a continous hydrobhopic background or vice versa. The surfaces are shown to be excellent tools for the preparation of arrays of nanocrystals.