Fabrication of Highly Ordered Silicon Oxide Dots and Stripes from Block Copolymer Thin Films | Zendy

Park S. | Zendy; Kim B. | Zendy; Wang J.Y. | Zendy; Russell T. P. | Zendy

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Fabrication of Highly Ordered Silicon Oxide Dots and Stripes from Block Copolymer Thin Films

Author(s) -

Park S.,

Kim B.,

Wang J.Y.,

Russell T. P.

Publication year - 2008

Publication title -

advanced materials

Language(s) - English

Resource type - Journals

SCImago Journal Rank - 10.707

H-Index - 527

eISSN - 1521-4095

pISSN - 0935-9648

DOI - 10.1002/adma.200701997

Subject(s) - materials science , fabrication , copolymer , nanoscopic scale , polydimethylsiloxane , thin film , silicon oxide , silicon , nanotechnology , oxide , template , optoelectronics , composite material , polymer , medicine , silicon nitride , alternative medicine , pathology , metallurgy

A general route to fabricate highly ordered arrays of nanoscopic silicon oxide dots and stripes (see figure) from block copolymer thin films is described. Poly(styrene‐ b ‐4‐vinylpyridine) thin films with cylindrical microdomains oriented normal and parallel to the surface were used as templates for the fabrication of nanoscopic silicon oxide, with polydimethylsiloxane as the inorganic precursor.

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