Premium
Fabrication of Highly Ordered Silicon Oxide Dots and Stripes from Block Copolymer Thin Films
Author(s) -
Park S.,
Kim B.,
Wang J.Y.,
Russell T. P.
Publication year - 2008
Publication title -
advanced materials
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 10.707
H-Index - 527
eISSN - 1521-4095
pISSN - 0935-9648
DOI - 10.1002/adma.200701997
Subject(s) - materials science , fabrication , copolymer , nanoscopic scale , polydimethylsiloxane , thin film , silicon oxide , silicon , nanotechnology , oxide , template , optoelectronics , composite material , polymer , medicine , silicon nitride , alternative medicine , pathology , metallurgy
A general route to fabricate highly ordered arrays of nanoscopic silicon oxide dots and stripes (see figure) from block copolymer thin films is described. Poly(styrene‐ b ‐4‐vinylpyridine) thin films with cylindrical microdomains oriented normal and parallel to the surface were used as templates for the fabrication of nanoscopic silicon oxide, with polydimethylsiloxane as the inorganic precursor.