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Self‐Sealing of Nanoporous Low Dielectric Constant Patterns Fabricated by Nanoimprint Lithography
Author(s) -
Ro Hyun Wook,
Peng Huagen,
Niihara Kenichi,
Lee HaeJeong,
Lin Eric K.,
Karim Alamgir,
Gidley David W.,
Jinnai Hiroshi,
Yoon Do Y.,
Soles Christopher L.
Publication year - 2008
Publication title -
advanced materials
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 10.707
H-Index - 527
eISSN - 1521-4095
pISSN - 0935-9648
DOI - 10.1002/adma.200701994
Subject(s) - nanoimprint lithography , materials science , nanoporous , dielectric , porosity , nanotechnology , lithography , composite material , optoelectronics , fabrication , pathology , medicine , alternative medicine
The cross‐sectional TEM image shows that line‐space patterns can be directly imprinted, with high fidelity, into highly porous spin‐on organosilicate materials. This publication quantifies how the porosity and distribution of pores within the patterns are affected by the nanoimprint lithography processes, including evidence for a densified pattern surface.