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Well‐Positioned Metallic Nanostructures Fabricated by Nanotransfer Edge Printing
Author(s) -
Xue M. Q.,
Yang Y. L.,
Cao T. B.
Publication year - 2008
Publication title -
advanced materials
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 10.707
H-Index - 527
eISSN - 1521-4095
pISSN - 0935-9648
DOI - 10.1002/adma.200701725
Subject(s) - materials science , wafer , lithography , enhanced data rates for gsm evolution , fabrication , nanotechnology , nanostructure , silicon , metal , nanolithography , screen printing , optoelectronics , composite material , metallurgy , telecommunications , computer science , medicine , alternative medicine , pathology
We describe a simple and experimentally convenient method to print and position metallic nanostructures on silicon wafer using nanotransfer edge printing (nTEP), which is a combination of thin‐film metal deposition, nanotransfer printing (nTP), and edge lithography. The shape, width, and aspect ratio of the metal nanostructures can be precisely tuned during the fabrication process.