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Selective Barrier Perforation in Porous Alumina Anodized on Substrates
Author(s) -
Oh Jihun,
Thompson Carl V.
Publication year - 2008
Publication title -
advanced materials
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 10.707
H-Index - 527
eISSN - 1521-4095
pISSN - 0935-9648
DOI - 10.1002/adma.200701719
Subject(s) - anodizing , materials science , etching (microfabrication) , perforation , electrode , porosity , oxide , nanotechnology , chemical engineering , composite material , layer (electronics) , metallurgy , aluminium , chemistry , engineering , punching
A new method for perforating the barrier oxide at the base of pores in alumina , which does not involve etching of the alumina, is reported. Anodization of Al layers on W leads to formation of WO 3 “plugs” that can be selectively etched without widening the as‐anodized pores. We demonstrate this technique, used with templated pore formation, by creating Ni nanoelectrode arrays with fixed electrode spacings (200 nm) but varied electrode diameters.