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e‐Beam Nanopatterned Photo‐Responsive Bacteriorhodopsin‐Containing Hydrogels
Author(s) -
Saaem I.,
Tian J.
Publication year - 2007
Publication title -
advanced materials
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 10.707
H-Index - 527
eISSN - 1521-4095
pISSN - 0935-9648
DOI - 10.1002/adma.200701401
Subject(s) - bacteriorhodopsin , self healing hydrogels , materials science , polyelectrolyte , acrylic acid , lithography , electron beam lithography , proton , swelling , nanotechnology , chemical engineering , optoelectronics , polymer chemistry , polymer , resist , composite material , membrane , chemistry , copolymer , biochemistry , physics , layer (electronics) , quantum mechanics , engineering
A photoresponsive nanopatterned hydrogel is demonstrated by combining a pH‐sensitive polyelectrolyte, poly(acrylic acid), with bacteriorhodopsin, a light‐activated proton pump capable of causing local pH changes. Utilizing electron‐beam lithography (EBL) on glass substrates, surface‐attached, nanopatterned hydrogels were fabricated capable of de‐swelling upon green light illumination.