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Novel Complex Nanostructure from Directed Assembly of Block Copolymers on Incommensurate Surface Patterns
Author(s) -
Kim S. O.,
Kim B. H.,
Meng D.,
Shin D. O.,
Koo C. M.,
Solak H. H.,
Wang Q.
Publication year - 2007
Publication title -
advanced materials
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 10.707
H-Index - 527
eISSN - 1521-4095
pISSN - 0935-9648
DOI - 10.1002/adma.200700957
Subject(s) - nanostructure , copolymer , materials science , nanotechnology , thin film , perpendicular , block (permutation group theory) , surface (topology) , self assembly , composite material , polymer , geometry , mathematics
A novel complex nanostructure , produced by the directed assembly of a block copolymer thin film on chemically patterned surfaces, is presented. The new nanostructure, which consists of cylinders oriented alternately parallel and perpendicular to the surface (see figure, a result of self‐consistent field calculations), demonstrates that a judiciously designed chemical pattern may be used to fabricate a well‐ordered complex nanostructure in block copolymer thin films.