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Well‐Aligned Nanocylinder Formation in Phase‐Separated Metal‐Silicide–Silicon and Metal‐Germanide–Germanium Systems
Author(s) -
Yasui N.,
Horie R.,
Ohashi Y.,
Tanji K.,
Den T.
Publication year - 2007
Publication title -
advanced materials
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 10.707
H-Index - 527
eISSN - 1521-4095
pISSN - 0935-9648
DOI - 10.1002/adma.200700726
Subject(s) - germanide , materials science , eutectic system , germanium , silicide , silicon , metal , sputtering , phase (matter) , metallurgy , deposition (geology) , optoelectronics , alloy , nanotechnology , thin film , paleontology , chemistry , organic chemistry , sediment , biology
Well‐aligned nanocylinder formation (see figure) is carried out by using conventional sputtering deposition. Various metal‐silicide–silicon and metal‐germanide–germanium systems exhibit uniform phase separation with ordered cylinder arrays in a matrix with periodic spacing from 1.9 to 20.2 nm. There is a correlation between the periodic spacing of the cylinders and the eutectic temperatures in these systems.