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Epitaxial Transition Metal Oxide Nanostructures Fabricated by a Combination of AFM Lithography and Molybdenum Lift‐Off
Author(s) -
Suzuki N.,
Tanaka H.,
Kawai T.
Publication year - 2008
Publication title -
advanced materials
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 10.707
H-Index - 527
eISSN - 1521-4095
pISSN - 0935-9648
DOI - 10.1002/adma.200700646
Subject(s) - materials science , microfabrication , lithography , nanotechnology , nanostructure , oxide , atomic force microscopy , nanoscopic scale , thin film , epitaxy , nanolithography , transition metal , optoelectronics , fabrication , catalysis , metallurgy , medicine , biochemistry , chemistry , alternative medicine , pathology , layer (electronics)
A novel process for the microfabrication of metal oxide nanostructures is developed based on combining thin film deposition at high temperatures with the use of a Mo mask fabricated by atomic force microscopy lithography. The Mo mask is lifted‐off using H 2 O 2 solution after deposition of the oxide film. The figure shows nanoscale Fe 2.5 Mn 0.5 O 4 stripes fabricated by this process.