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High‐Throughput Synthesis of Anisotropic Colloids via Holographic Lithography
Author(s) -
Moon J. H.,
Kim A. J.,
Crocker J. C.,
Yang S.
Publication year - 2007
Publication title -
advanced materials
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 10.707
H-Index - 527
eISSN - 1521-4095
pISSN - 0935-9648
DOI - 10.1002/adma.200700543
Subject(s) - materials science , lithography , holography , photoresist , dispersity , nanotechnology , colloid , photolithography , optoelectronics , optics , chemical engineering , polymer chemistry , layer (electronics) , physics , engineering
Monodisperse anisotropic colloids are synthesized (see figure) via holographic lithography and using chemically amplified photoresists. The holographic lithography offers a high‐throughput and flexible route to produce particles. To engineer colloidal particles, we apply direct modification of the photoresist surface either uniformly or selectively through chemical coupling, physical grafting, and selective metal deposition.