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Synthesis of Vertical High‐Density Epitaxial Si(100) Nanowire Arrays on a Si(100) Substrate Using an Anodic Aluminum Oxide Template
Author(s) -
Shimizu T.,
Xie T.,
Nishikawa J.,
Shingubara S.,
Senz S.,
Gösele U.
Publication year - 2007
Publication title -
advanced materials
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 10.707
H-Index - 527
eISSN - 1521-4095
pISSN - 0935-9648
DOI - 10.1002/adma.200700153
Subject(s) - materials science , nanopore , substrate (aquarium) , nanowire , epitaxy , chemical vapor deposition , aluminium , oxide , nanotechnology , deposition (geology) , silicon , anodic aluminum oxide , chemical engineering , anode , optoelectronics , layer (electronics) , metallurgy , electrode , fabrication , medicine , paleontology , oceanography , alternative medicine , pathology , sediment , engineering , biology , geology , chemistry
Growth of vertical epitaxial Si(100) nanowires on Si(100) substrates is demonstrated (see figure) using a combination of an anodic aluminum oxide template, catalytic Au particles embedded in nanopores directly on the Si substrate by using electroless deposition, and vapor–liquid–solid growth using SiH 4 . HF acid treatment of the porous alumina template is important to realize a direct contact between deposited Au in the AAO nanopores and the Si substrate.