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Synthesis and Surface Engineering of Complex Nanostructures by Atomic Layer Deposition
Author(s) -
Knez M.,
Nielsch K.,
Niinistö L.
Publication year - 2007
Publication title -
advanced materials
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 10.707
H-Index - 527
eISSN - 1521-4095
pISSN - 0935-9648
DOI - 10.1002/adma.200700079
Subject(s) - atomic layer deposition , materials science , nanotechnology , nanomaterials , nanostructure , nanowire , silicon , silicon nanowires , nanopore , layer (electronics) , deposition (geology) , surface modification , chemical engineering , optoelectronics , paleontology , sediment , engineering , biology
Atomic layer deposition (ALD) has recently become the method of choice for the semiconductor industry to conformally process extremely thin insulating layers (high‐ k oxides) onto large‐area silicon substrates. ALD is also a key technology for the surface modification of complex nanostructured materials. After briefly introducing ALD, this Review will focus on the various aspects of nanomaterials and their processing by ALD, including nanopores, nanowires and ‐tubes, nanopatterning and nanolaminates as well as low‐temperature ALD for organic nanostructures and biomaterials. Finally, selected examples will be given of device applications, illustrating recent innovative approaches of how ALD can be used in nanotechnology.