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Fabrication of Double‐Length‐Scale Patterns via Lithography, Block Copolymer Templating, and Electrodeposition
Author(s) -
Tseng Y.T.,
Tseng W.H.,
Lin C.H.,
Ho R.M.
Publication year - 2007
Publication title -
advanced materials
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 10.707
H-Index - 527
eISSN - 1521-4095
pISSN - 0935-9648
DOI - 10.1002/adma.200700042
Subject(s) - fabrication , materials science , nanotechnology , copolymer , lithography , substrate (aquarium) , electroplating , composite number , carbon nanotube , optoelectronics , polymer , composite material , layer (electronics) , medicine , oceanography , alternative medicine , pathology , geology
A straightforward and effective method for the fabrication of double‐length‐scale patterned (i.e., composite micro‐ and nanopatterned) carbon nanotube (CNT) arrays can be achieved by block copolymer templating on a prepatterned conducting substrate followed by electroplating to deposit Ni (see figure). Significant improvement in the current density with low threshold voltage and high field‐emission efficiency can be found in the composite micro‐ and nanopatterns of CNT arrays.